The influence of argon pressure and RF power on the growth of InP thin films
The influence of argon pressure and RF power on the growth of InP thin films
| dc.contributor.author | Gali Chandra | en |
| dc.contributor.author | Javier Cruz | en |
| dc.contributor.author | J. Ventura | en |
| dc.date.accessioned | 2017-11-16T13:11:59Z | |
| dc.date.available | 2017-11-16T13:11:59Z | |
| dc.date.issued | 2011 | en |
| dc.description.abstract | en | |
| dc.identifier.uri | http://repositorio.inesctec.pt/handle/123456789/2087 | |
| dc.language | eng | en |
| dc.relation | 4719 | en |
| dc.rights | info:eu-repo/semantics/openAccess | en |
| dc.title | The influence of argon pressure and RF power on the growth of InP thin films | en |
| dc.type | article | en |
| dc.type | Publication | en |